Simultaneous observation of zone-axis pattern and ±g dark-field pattern in convergent-beam electron diffraction

Masami Terauchi, Michiyoshi Tanaka

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)

    Abstract

    A convergent-beam electron diffraction (CBED) technique to take the four patterns (whole pattern, bright-field, dark-field and ±G dark-field patterns) which are needed for crystal-point-group determination simultaneously on a film is described with ray path diagrams and obtained results. The technique enables us to obtain these patterns from a 100-nm diameter specimen area with less contamination and to set the exact Bragg angles at the centers of reflection disks. The present method Is compared with other techniques, especially with one previous technique EM. Terauchl and M. Tanaka: J. Electron Microsc., 34, 128 (1985)]. Some application results of the present technique to real crystals are demonstrated.

    Original languageEnglish
    Pages (from-to)347-356
    Number of pages10
    JournalJournal of Electron Microscopy
    Volume34
    Issue number4
    Publication statusPublished - 1985 Dec 1

    Keywords

    • Convergent-beam electron diffraction (CBED)
    • Dark-field
    • Point and space group determination
    • Zone-axis pattern

    ASJC Scopus subject areas

    • Instrumentation

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