Simultaneous observation of surface morphology and dielectric properties using non-contact scanning nonlinear dielectric microscopy with atomic resolution

Ryusuke Hirose, Yasuo Cho

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Recently, we have developed Non-Contact Scanning Nonlinear Dielectric Microscopy (NC-SNDM) with a new height-control technique utilizing higher order nonlinear dielectric constant detection (e(4) signal). In theoretically, NC-SNDM has quite high height sensitivity against the gap between tip and sample as well as STM technique and the simultaneous observation of the topography and ferroelectric polarization (local dipole moment) distribution with atomic resolution has been expected. To confirm such performance of NC-SNDM with atomic resolution, UHV-SNDM was developed and Si(111) cleaned surface was chosen as a specimen. As a result, we have succeeded in observing Si(111) 7×7 atomic structure. Moreover, distribution of tunneling current and lowest order nonlinear dielectric signal ε(3) could be observed simultaneously. To the best our knowledge, this is the first successful demonstration of the atomic resolution achievement in dielectric microscopy techniques.

Original languageEnglish
Title of host publicationFerroelectrics and Multiferroics
Pages186-191
Number of pages6
Publication statusPublished - 2006 Dec 1
Event2006 MRS Fall Meeting - Boston, MA, United States
Duration: 2006 Nov 272006 Nov 29

Publication series

NameMaterials Research Society Symposium Proceedings
Volume966
ISSN (Print)0272-9172

Other

Other2006 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period06/11/2706/11/29

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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