Simulation of atomic force microscopy image variations along the surface normal: Presence of possible resolution limit in the attractive force range

Masaharu Komiyama, Kazuya Tsujimichi, Shin’Ya Ohkubo, Katsuyuki Tazawa, Momoji Kubo, Akira Miyamoto

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Variations of atomic force microscopy (AFM) images as tip-sample distance is varied were examined using a newly developed AFM simulation code ACCESS (AFM simulation Code for Calculating and Evaluating Surface structures) with a Morse-type pairwise potential. A model system consisting of a single atom tip (an “ideal” AFM tip) and a face-centered cubic (fee) (100) surface with or without point defect showed perfect atomic resolution when scanning was performed in the repulsive force range. In the attractive force range, image contrast inversion was observed twice with the increase of tip-sample distance. Simulation on the point defect surface indicated that this inversion is due to a collective force from more than one atom being imaged as one bright spot. Exact correspondence between the sample surface registry and the simulated image in this force range appears to be coincidental.

Original languageEnglish
Pages (from-to)L789-L792
JournalJapanese Journal of Applied Physics
Volume34
Issue number6
DOIs
Publication statusPublished - 1995 Jun 1

Keywords

  • Atomic force microscopy
  • Attractive force
  • Morse potential
  • Noncontact mode
  • Point defects
  • Resolution limit
  • Simulation

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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