Simulation analysis of the characteristics of a high magnification imaging optics for the observation of extreme ultraviolet lithography mask to predict phase defect printability

Tsuneo Terasawa, Yukiyasu Arisawa, Tsuyoshi Amano, Takeshi Yamane, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Hiroo Kinoshita

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

By employing simulation, we analyzed the characteristic of the optics of high-magnification multilayer-coated mirror employed for the examination of extreme ultraviolet lithography (EUVL) mask, and we also examined the performance of phase defect printability prediction. The imaging optics comprises Schwarzschild optics and a concave mirror; and it is modeled as an imaging means with an annular-shaped pupil. In this simulation, tilted coherent illumination that was successfully applied in an EUV microscope constructed at a beamline of the NewSUBARU, was assumed. Observation images of mask patterns affected by phase defects were simulated assuming EUVL masks representing half pitches of 16 and 11nm generations; and those simulated results were compared with the simulated reduction-projection images on wafer formed by an exposure tool. Although the high-magnification observation optics does not completely emulate the printed pattern images on wafer it predicts the existence of phase defects and predict the value of their impacts.

Original languageEnglish
Article number096601
JournalJapanese journal of applied physics
Volume52
Issue number9
DOIs
Publication statusPublished - 2013 Sep 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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