Simple removal technology using ozone solution for chemically-stable polymer used for MEMS

H. Yanagida, Shinya Yoshida, Masayoshi Esashi, Shuji Tanaka

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

This paper reports simple removal technology using ozone solution for chemically-stable polymers such as SU-8, BCB, polyimide and carbonized resist. Conventionally, these polymers are difficult to remove completely by O2 plasma and organic solutions because of their chemical stability and inorganic additives. In this study, these polymers were etched using acetic acid and water solution of ozone. Residue analysis after polymer etching was performed by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The analysis demonstrated that the ozone solution could etch and remove these polymers without residue. This strong etching effect might be attributed to strong organic decomposition ability of ozone and rinse effect of inorganic materials in wet process.

Original languageEnglish
Title of host publication2011 IEEE 24th International Conference on Micro Electro Mechanical Systems, MEMS 2011
Pages324-327
Number of pages4
DOIs
Publication statusPublished - 2011 Apr 13
Event24th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2011 - Cancun, Mexico
Duration: 2011 Jan 232011 Jan 27

Other

Other24th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2011
CountryMexico
CityCancun
Period11/1/2311/1/27

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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    Yanagida, H., Yoshida, S., Esashi, M., & Tanaka, S. (2011). Simple removal technology using ozone solution for chemically-stable polymer used for MEMS. In 2011 IEEE 24th International Conference on Micro Electro Mechanical Systems, MEMS 2011 (pp. 324-327). [5734427] https://doi.org/10.1109/MEMSYS.2011.5734427