We demonstrate the validity of very simple methods for site-controlled carbon nanotube growth using a radio-frequency magnetron-type plasma-enhanced chemical vapor deposition technique. Enhanced plasma density and optimized ion-bombardment energy achieved by magnetic field introduction are found to be responsible for the uniform and well-aligned carbon nanotube growth. Based on these results, we attempted to perform experiments on site-controlled carbon nanotube growth using very convenient methods such as scratching or simply masking a substrate surface where carbonaceous materials deposit.
|Number of pages||3|
|Journal||Applied Physics A: Materials Science and Processing|
|Publication status||Published - 2004 Jun 1|
ASJC Scopus subject areas
- Materials Science(all)