Simple methods for site-controlled carbon nanotube growth using radio-frequency plasma-enhanced chemical vapor deposition

G. H. Jeong, N. Satake, Toshiaki Kato, T. Hirata, R. Hatakeyama, Kazuyuki Tohji

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

We demonstrate the validity of very simple methods for site-controlled carbon nanotube growth using a radio-frequency magnetron-type plasma-enhanced chemical vapor deposition technique. Enhanced plasma density and optimized ion-bombardment energy achieved by magnetic field introduction are found to be responsible for the uniform and well-aligned carbon nanotube growth. Based on these results, we attempted to perform experiments on site-controlled carbon nanotube growth using very convenient methods such as scratching or simply masking a substrate surface where carbonaceous materials deposit.

Original languageEnglish
Pages (from-to)85-87
Number of pages3
JournalApplied Physics A: Materials Science and Processing
Volume79
Issue number1
DOIs
Publication statusPublished - 2004 Jun 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

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