Silicon self-diffusion in heavily B-doped Si using highly pure 30Si epitaxial layer

S. Matsumoto, S. R. Aid, S. Seto, K. Toyonaga, Y. Nakabayashi, M. Sakuraba, Y. Shimamune, Y. Hashiba, Junichi Murota, K. Wada, T. Abe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

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Engineering & Materials Science