Abstract
The role of hydrogen peroxide in RCA standard clean was roughly clarified by angle-resolved photoelectron spectroscopy and infrared absorption spectroscopy such that the oxidation, by basic hydrogen peroxide results in a negligible amount of SiH bonds in native oxide, while the oxidation by acidic hydrogen peroxide results in a small amount of SiH bonds in native oxide. It is also found that oxidation in a boiling solution of HNO 3 results in large amount of SiH bonds in native oxide as in the case of oxidation in a hot solution of HNO 3 .
Original language | English |
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Pages (from-to) | 836-840 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 56-58 |
Issue number | PART 2 |
DOIs | |
Publication status | Published - 1992 Jan 1 |
ASJC Scopus subject areas
- Surfaces, Coatings and Films