Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster

Akira Watanabe, Masashi Unno, Fusao Hojo, Takao Miwa

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

A technique that is used to obtain Si-Ge alloys using a coating technique is developed. In this technique, an organo-soluble germanium cluster is spin-coated on a silicon substrate and the heat treatment of the substrate leads to the formation of a Si-Ge alloy on the substrate. The structural changes of the thin film and the silicon surface by alloying germanium into silicon are analyzed by micro-Raman spectroscopy.

Original languageEnglish
Pages (from-to)89-94
Number of pages6
JournalMaterials Letters
Volume47
Issue number1-2
DOIs
Publication statusPublished - 2001 Jan

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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