Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster

Akira Watanabe; Masashi Unno; Fusao Hojo; Takao Miwa

doi:10.1016/S0167-577X(00)00217-2

Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster

Akira Watanabe, Masashi Unno, Fusao Hojo, Takao Miwa

Center for Mineral Processing and Metallurgy (CMPM)

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

A technique that is used to obtain Si-Ge alloys using a coating technique is developed. In this technique, an organo-soluble germanium cluster is spin-coated on a silicon substrate and the heat treatment of the substrate leads to the formation of a Si-Ge alloy on the substrate. The structural changes of the thin film and the silicon surface by alloying germanium into silicon are analyzed by micro-Raman spectroscopy.

Original language	English
Pages (from-to)	89-94
Number of pages	6
Journal	Materials Letters
Volume	47
Issue number	1-2
DOIs	https://doi.org/10.1016/S0167-577X(00)00217-2
Publication status	Published - 2001 Jan

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster",

abstract = "A technique that is used to obtain Si-Ge alloys using a coating technique is developed. In this technique, an organo-soluble germanium cluster is spin-coated on a silicon substrate and the heat treatment of the substrate leads to the formation of a Si-Ge alloy on the substrate. The structural changes of the thin film and the silicon surface by alloying germanium into silicon are analyzed by micro-Raman spectroscopy.",

author = "Akira Watanabe and Masashi Unno and Fusao Hojo and Takao Miwa",

note = "Funding Information: This work was partially supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture, Japan.",

year = "2001",

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doi = "10.1016/S0167-577X(00)00217-2",

language = "English",

volume = "47",

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journal = "Materials Letters",

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T1 - Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster

AU - Watanabe, Akira

AU - Unno, Masashi

AU - Hojo, Fusao

AU - Miwa, Takao

N1 - Funding Information: This work was partially supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture, Japan.

PY - 2001/1

Y1 - 2001/1

N2 - A technique that is used to obtain Si-Ge alloys using a coating technique is developed. In this technique, an organo-soluble germanium cluster is spin-coated on a silicon substrate and the heat treatment of the substrate leads to the formation of a Si-Ge alloy on the substrate. The structural changes of the thin film and the silicon surface by alloying germanium into silicon are analyzed by micro-Raman spectroscopy.

AB - A technique that is used to obtain Si-Ge alloys using a coating technique is developed. In this technique, an organo-soluble germanium cluster is spin-coated on a silicon substrate and the heat treatment of the substrate leads to the formation of a Si-Ge alloy on the substrate. The structural changes of the thin film and the silicon surface by alloying germanium into silicon are analyzed by micro-Raman spectroscopy.

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U2 - 10.1016/S0167-577X(00)00217-2

DO - 10.1016/S0167-577X(00)00217-2

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JO - Materials Letters

JF - Materials Letters

SN - 0167-577X

IS - 1-2

ER -

Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster

Abstract

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