Silicon-germanium alloys prepared by the heat treatment of silicon substrate spin-coated with organo-soluble germanium cluster

A technique that is used to obtain Si-Ge alloys using a coating technique is developed. In this technique, an organo-soluble germanium cluster is spin-coated on a silicon substrate and the heat treatment of the substrate leads to the formation of a Si-Ge alloy on the substrate. The structural changes of the thin film and the silicon surface by alloying germanium into silicon are analyzed by micro-Raman spectroscopy.