Abstract
A technique that is used to obtain Si-Ge alloys using a coating technique is developed. In this technique, an organo-soluble germanium cluster is spin-coated on a silicon substrate and the heat treatment of the substrate leads to the formation of a Si-Ge alloy on the substrate. The structural changes of the thin film and the silicon surface by alloying germanium into silicon are analyzed by micro-Raman spectroscopy.
Original language | English |
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Pages (from-to) | 89-94 |
Number of pages | 6 |
Journal | Materials Letters |
Volume | 47 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 2001 Jan |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering