Silica-coating of AgI semiconductor nanoparticles

Yoshio Kobayashi, Kiyoto Misawa, Motohiro Takeda, Masaki Kobayashi, Masanobu Satake, Yoshiyuki Kawazoe, Noriaki Ohuchi, Atsuo Kasuya, Mikio Konno

Research output: Contribution to journalArticlepeer-review

38 Citations (Scopus)

Abstract

A method for silica-coating of AgI nanoparticles is proposed, which applies Stöber method in the presence of a silane coupling agent, 3-mercaptopropyltrimethoxysilane (MPS), with the use of dimethylamine (DMA) catalyst for alkoxide hydrolysis. The AgI nanoparticles were prepared from AgClO4 and KI. The silica-coating was performed with 0-2.3 × 10-5 M MPS, 11-20 M water, 0-0.1 M DMA and 0.0004-0.15 M tetraethyl orthosilicate (TEOS). The addition of MPS suppressed generation of free silica particles and improved uniformity of shell thickness. Silica shells were formed at water concentrations of 11-15 M, but excess water (20 M) caused aggregation of free silica particles, and resulted in formation of gel network. The silica shell thickness could be varied from 3 to 33.0 nm as the TEOS concentration was increased from 0.0004 to 0.04 M at 4.5 × 10-6 M MPS under the condition of 11 M water and 0.01 M DMA.

Original languageEnglish
Pages (from-to)197-201
Number of pages5
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume251
Issue number1-3
DOIs
Publication statusPublished - 2004 Dec 20

Keywords

  • AgI
  • Core-shell
  • Nanoparticle
  • Silica coating
  • Sol-gel
  • Stöber method

ASJC Scopus subject areas

  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

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