Side etch control of n+-polysilicon with nitrogen added chlorine plasma

Takashi Matsuura, Junichi Murota, Tadahiro Ohmi, Soichi Ono

Research output: Contribution to conferencePaperpeer-review

1 Citation (Scopus)


Dive into the research topics of 'Side etch control of n<sup>+</sup>-polysilicon with nitrogen added chlorine plasma'. Together they form a unique fingerprint.

Engineering & Materials Science