SiC-SiO2 nanocomposite films prepared by laser CVD using tetraethyl orthosilicate and acetylene as precursors

Shu Yu, Rong Tu, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

SiC-SiO2 nanocomposite films were prepared by laser chemical vapor deposition (LCVD) using a CO2 laser with tetraethyl orthosilicate (TEOS) and acetylene (C2H2) as precursors. The effects of laser power on the crystal phase and microstructure of the SiC-SiO2 nanocomposite films were investigated. Films produced with laser power below 150 W (below 1523 K) had an amorphous structure, while those produced above 200 W (above 1673 K) were a mixture of crystalline SiC and amorphous phase. At 245 W (1774 K) the film contained 3C-SiC nanocrystals 100 to 200 nm in diameter dispersed in an amorphous matrix having high-density stacking faults formed on the (τττ) and (11τ) planes.

Original languageEnglish
Pages (from-to)2151-2154
Number of pages4
JournalMaterials Letters
Volume64
Issue number20
DOIs
Publication statusPublished - 2010 Oct 31

Keywords

  • Laser CVD
  • Microstructure
  • Nanocomposites
  • SiC-SiO

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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