Shielded-loop-type onchip magnetic-field probe to evaluate radiated emission from thin-film noise suppressor

Masahiro Yamaguchi; Shota Koya; Hideki Torizuka; Satoshi Aoyama; Shoji Kawahito

doi:10.1109/TMAG.2007.892998

Shielded-loop-type onchip magnetic-field probe to evaluate radiated emission from thin-film noise suppressor

Masahiro Yamaguchi, Shota Koya, Hideki Torizuka, Satoshi Aoyama, Shoji Kawahito

ENG - Electrical Engineering

Research output: Contribution to journal › Article

19 Citations (Scopus)

Abstract

A silicon integrated RF magnetic field probe has been designed and microfabricated using CMOS-silicon-on-insulator (SOI) technology with a 0.15-μm design rule on a high-resistivity silicon substrate. The size of the coil window was 180 × 180 μm³. Coil and electrodes were separated by a 530-μm-long stripline so as to avoid stray voltage induction at the electrode portion. This probe was applied to evaluate the radiated emission from a thin-film electromagnetic noise suppressor. It was clarified and shown that the field intensity was suppressed by 4.0 dB at the center of the signal line at 1 GHz.

Original language	English
Pages (from-to)	2370-2372
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	43
Issue number	6
DOIs	https://doi.org/10.1109/TMAG.2007.892998
Publication status	Published - 2007 Jun 1

Keywords

Amorphous magnetic films
Complementary metal-oxide semiconductor (CMOS) analog integrated circuits (ICs)
Electromagnetic radiative interference
Magnetic resonance
Magnetic-field measurement
Packaging

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

Access to Document

10.1109/TMAG.2007.892998

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title = "Shielded-loop-type onchip magnetic-field probe to evaluate radiated emission from thin-film noise suppressor",

abstract = "A silicon integrated RF magnetic field probe has been designed and microfabricated using CMOS-silicon-on-insulator (SOI) technology with a 0.15-μm design rule on a high-resistivity silicon substrate. The size of the coil window was 180 × 180 μm3. Coil and electrodes were separated by a 530-μm-long stripline so as to avoid stray voltage induction at the electrode portion. This probe was applied to evaluate the radiated emission from a thin-film electromagnetic noise suppressor. It was clarified and shown that the field intensity was suppressed by 4.0 dB at the center of the signal line at 1 GHz.",

keywords = "Amorphous magnetic films, Complementary metal-oxide semiconductor (CMOS) analog integrated circuits (ICs), Electromagnetic radiative interference, Magnetic resonance, Magnetic-field measurement, Packaging",

author = "Masahiro Yamaguchi and Shota Koya and Hideki Torizuka and Satoshi Aoyama and Shoji Kawahito",

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AU - Yamaguchi, Masahiro

AU - Koya, Shota

AU - Torizuka, Hideki

AU - Aoyama, Satoshi

AU - Kawahito, Shoji

PY - 2007/6/1

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KW - Amorphous magnetic films

KW - Complementary metal-oxide semiconductor (CMOS) analog integrated circuits (ICs)

KW - Electromagnetic radiative interference

KW - Magnetic resonance

KW - Magnetic-field measurement

KW - Packaging

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