SEMICONDUCTOR FIELD ION MICROGRAPHS.

Toshio Sakurai, Toyo Sakata, Akiko Jimbo

    Research output: Chapter in Book/Report/Conference proceedingChapter

    5 Citations (Scopus)

    Abstract

    Using commercially available wafers, imaging of various semiconductor surfaces was attempted by field ion microscopy (FIM). High quality images were obtained for Si, Ge, GaAs and GaP.

    Original languageEnglish
    Title of host publicationJapanese Journal of Applied Physics, Part 2: Letters
    Pages775-776
    Number of pages2
    Volume22
    Edition12
    Publication statusPublished - 1983 Dec

    ASJC Scopus subject areas

    • Engineering(all)

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