Self-limited layer-by-layer etching of Si by alternated chlorine adsorption and Ar+ ion irradiation

Takashi Matsuura, Junichi Murota, Yasuji Sawada, Tadahiro Ohmi

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82 Citations (Scopus)

Abstract

We report the observation of self-limited layer-by-layer etching of Si by alternated chlorine adsorption and low energy Ar+ ion irradiation using an ultraclean electron-cyclotron-resonance plasma apparatus. The etch rate per cycle increased with the chlorine supplying time and saturated to a constant value of about 1/2 atomic layer per cycle for Si(100) and 1/3 for Si(111), which was independent of the chlorine partial pressure in the range of 1.3-6.7 mPa. These results indicate that etching was determined by self-limited adsorption of chlorine. Moreover, the chlorine adsorption rate was found to be described by a Langmuir-type equation with an adsorption rate constant k=83 and 110 (Pa s)-1 for Si(100) and Si(111), respectively.

Original languageEnglish
Pages (from-to)2803-2805
Number of pages3
JournalApplied Physics Letters
Volume63
Issue number20
DOIs
Publication statusPublished - 1993 Dec 1

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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