Self-formed copper oxide contact interlayer for high-performance oxide thin film transistors

Xu Gao, Shinya Aikawa, Nobuhiko Mitoma, Meng Fang Lin, Takio Kizu, Toshihide Nabatame, Kazuhito Tsukagoshi

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

Abstract

Oxide thin film transistor employing copper source/drain electrodes shows a small turn on voltage and reduced hysteresis. Cross-sectional high-resolution transmission electron microscopy image confirmed the formation of ∼4 nm CuOx related interlayer. The lower bond-dissociation energy of Cu-O compared to Si-O and In-O suggests that the interlayer was formed by adsorbing oxygen molecules from surrounding environment instead of getting oxygen atoms from the semiconductor film. The formation of CuOx interlayer acting as an acceptor could suppress the carrier concentration in the transistor channel, which would be utilized to control the turn on voltage shifts in oxide thin film transistors.

Original languageEnglish
Article number023503
JournalApplied Physics Letters
Volume105
Issue number2
DOIs
Publication statusPublished - 2014 Jul 14
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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