Self-formation of Ti-rich interfacial layers in Cu(Ti) alloy films

Kazuhiro Ito, Susumu Tsukimoto, Masanori Murakami

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)


To study the self-formation mechanism of Ti-rich layers in Cu(Ti) alloy films, the microstructures and electrical resistivities of the Cu(Ti) alloy films were investigated by changing the annealing atmosphere and substrate materials. Oxygen contained in Ar facilitated Ti segregation at the surface, reduced the Ti content in the alloy films, and formed relatively large grains in the alloy films, which are essential for low-resistivity Cu alloy films. For the self-formation of the Ti-rich barrier layer, it was found that the selection of a substrate that is reactive to Ti atoms (forming Ti compounds) was essential. Although a strong reaction of the Ti atoms in the alloy films with SiN compared with that with SiO2 was expected, the resistivities in the annealed Cu(Ti) alloy films on the SiN/Si substrates were higher than those on the SiO2/Si substrates. Further reduction of the resistivities is required for application of the fabrication process to devices.

Original languageEnglish
Pages (from-to)1942-1946
Number of pages5
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number4 B
Publication statusPublished - 2007 Apr 24
Externally publishedYes


  • Barrier layer
  • Cu(Ti) alloy film
  • Reaction
  • Resistivity
  • Self-formation

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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