Abstract
Using elementary Se we grew Se-doped GaAs films on GaAs (111), (411), (711) and (100) substrates by molecular beam epitaxy. The films grown on all the high-index substrates showed n-type conduction and the maximum carrier concentration reached 2.1×1019 cm-3 for the film grown on the (411)B substrate. The carrier concentration began to saturate at a Se concentration near 1019 cm-3 but continued to increase up to a Se concentration of 2×1020 cm-3. Above 2×1020 cm-3 Se concentration, slow reduction of the carrier concentration was observed. We obtained excellent surface morphology when n-type GaAs films were grown on (411)A and (711)B substrates even at a Se concentration of 7×1020 cm-3.
Original language | English |
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Pages (from-to) | 743-747 |
Number of pages | 5 |
Journal | Microelectronics Journal |
Volume | 28 |
Issue number | 8-10 |
DOIs | |
Publication status | Published - 1997 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering