Selective tungsten deposition into ordered nanohole arrays of anodic porous alumina by electron-beam-induced deposition

G. Q. Xie, M. Song, K. Mitsuishi, K. Furuya

    Research output: Contribution to journalArticle

    11 Citations (Scopus)

    Abstract

    The selective deposition of a metal (tungsten) into ordered nanohole arrays of an anodic porous alumina membrane was performed using an electron-beam-induced deposition process. After deposition, the membrane was observed and analyzed using electron microscopy and energy-dispersive X-ray spectroscopy. It is shown that the deposition was preferentially conducted in the holes in the irradiated area of the electron beam. A calculation of the electron-beam intensity explains the reason for the preferential deposition in the holes.

    Original languageEnglish
    Pages (from-to)1843-1846
    Number of pages4
    JournalApplied Physics A: Materials Science and Processing
    Volume79
    Issue number8
    DOIs
    Publication statusPublished - 2004 Dec 1

    ASJC Scopus subject areas

    • Chemistry(all)
    • Materials Science(all)

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