Reactivity of copper dipivaloylmethanate (Cu(DPM)2) adsorbed selectively on the H2O on a SrTiO3(1 0 0) surface is discussed. Reaction of the adsorbed (Cu(DPM)2 with H2O vapor at 473 K results in the removal of the ligand, DPM, leaving the highly dispersed copper atoms in the +1 oxidation state on the surface. Dispersed copper is found to aggregate to form particulates at 673 K.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Energy Engineering and Power Technology
- Electrical and Electronic Engineering