Selective surface reaction between metal compounds and surface functional groups

Tokihisa Hikita, Rika Sekine, Takashi Hanada, Maki Kawai

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Reactivity of copper dipivaloylmethanate (Cu(DPM)2) adsorbed selectively on the H2O on a SrTiO3(1 0 0) surface is discussed. Reaction of the adsorbed (Cu(DPM)2 with H2O vapor at 473 K results in the removal of the ligand, DPM, leaving the highly dispersed copper atoms in the +1 oxidation state on the surface. Dispersed copper is found to aggregate to form particulates at 673 K.

Original languageEnglish
Pages (from-to)148-150
Number of pages3
JournalPhysica C: Superconductivity and its applications
Volume190
Issue number1-2
DOIs
Publication statusPublished - 1991 Dec 2
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering

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