Selective deposition of diamond films on insulators by selective seeding with a double-layer mask

H. W. Liu, C. X. Gao, X. Li, C. X. Wang, Y. H. Han, G. T. Zou

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Polycrystalline diamond films have been patterned on Si3N4/Si and SiO2/Si substrates by selective seeding with a double-layer mask via hot-filament chemical vapor deposition. High quality in the patterned diamond films and high selectivity were obtained by the process. The diamond films deposited on the insulators at different CH4/H2 concentrations were studied by scanning electron microscopy and Raman spectroscopy. The process proved to be far less damaging to the substrates, and yet effective in developing patterns of diamond films on a large and different substrate.

Original languageEnglish
Pages (from-to)1573-1577
Number of pages5
JournalDiamond and Related Materials
Volume10
Issue number9-10
DOIs
Publication statusPublished - 2001 Sep

Keywords

  • Diamond film
  • Double-layer mask
  • Selective deposition
  • Selective seeding

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Selective deposition of diamond films on insulators by selective seeding with a double-layer mask'. Together they form a unique fingerprint.

Cite this