Selection of Di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography

Masaru Nakagawa, Kei Kobayashi, Azusa N. Hattori, Shunya Ito, Nobuya Hiroshiba, Shoichi Kubo, Hidekazu Tanaka

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    Physics & Astronomy

    Engineering & Materials Science

    Chemical Compounds