Secondary electron effect on electron beam induced charging of Sio2 particle analyzed by electron holography

Hiroaki Suzuki, Zentaro Akase, Kodai Niitsu, Toshiaki Tanigaki, Daisuke Shindo

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)

    Abstract

    Charging of a SiO2 particle induced by electron illumination was investigated by changing the illuminated area of the particle and its support film through control of the position of the mask plate inserted in a transmission electron microscope illumination system. The electric fields around the charged SiO2 particle were analyzed using electron holography. The amount of charge was evaluated quantitatively by comparing the reconstructed phase images with the simulated phase images. When the support film was not covered against the incident electron beam, secondary electrons emitted from the conductive support film were attracted to the charged particle, resulting in particle discharge. In contrast, when the support film was completely covered, secondary electrons were not emitted from the film, so that the particle remained positively charged.

    Original languageEnglish
    Pages (from-to)167-171
    Number of pages5
    JournalMicroscopy
    Volume66
    Issue number3
    DOIs
    Publication statusPublished - 2017 Jun 1

    Keywords

    • Amorphous SiO
    • Charging
    • Electric field
    • Electric potential
    • Electron holography
    • Secondary electron

    ASJC Scopus subject areas

    • Structural Biology
    • Instrumentation
    • Radiology Nuclear Medicine and imaging

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