Scanning tunneling microscopy study of the initial reaction of SiH 2 Cl 2 molecules with the Si(111)-7 x 7 surface

Takuji Komura, Shinya Okano, Keiji Morikawa, Takashi Hanada, Masamichi Yoshimura, Takafumi Yao

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The initial stage of the reaction of dichlorosilane (SiH 2 Cl 2 ) with the Si(111)-(7 × 7) surface under exposure below 1 L is investigated using a scanning tunneling microscope (STM). We found that corner adatoms are preferentially reacted over the center adatoms at the very beginning of exposure. The initial reaction process of SiH 2 Cl 2 with Si(111)-(7 × 7) surface is discussed. It is suggested that the preferential reactivity of a corner-hole atom is reduced as the exposure increases, which may give rise to reacted rest atoms.

Original languageEnglish
Pages (from-to)23-28
Number of pages6
JournalApplied Surface Science
Volume130-132
DOIs
Publication statusPublished - 1998 Jun

Keywords

  • Dichlorosilane
  • Dissociative adsorption
  • Initial reaction
  • Preferential adsorption site
  • Scanning tunneling microscopy
  • Silicon

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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