Scanning probe lithography on InAs substrate

Lionel F. Houlet, Hiroshi Yaraaguchi, Yoshiro Hirayama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this study, we focus our interest on patterning a conventional electron beam resist by electron field emission exposure using Atomic Force Microscope (AFM). We have fabricated 50-140 nm deep structures in InAs with the resolution less than 100 nm through 20 nm thick PMMA resist that was exposed. According to our knowledge, electron field emission exposure of resist has already been performed on gold, silicon but never on InAs substrate. Compared with other semiconductors, InAs has the Fermi level pinned in the conduction band leading to the superior electric property even for nanometer scale structures. Using electron field emission exposure technique, structures deeper than 100 nm can be performed that is enough to release suspended free structures after chemical etching, being ideal for nanowire and NanoElectroMechanical Systems (NEMS). In the following, we will describe the experimental set-up and results of fabrication.

Original languageEnglish
Title of host publication2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004
EditorsM. Laudon, B. Romanowicz
Pages153-155
Number of pages3
Publication statusPublished - 2004
Event2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004 - Boston, MA, United States
Duration: 2004 Mar 72004 Mar 11

Publication series

Name2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004
Volume3

Other

Other2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004
CountryUnited States
CityBoston, MA
Period04/3/704/3/11

Keywords

  • Atomic force microscope
  • InAs
  • Nanolithography
  • Nanowire
  • Scanning probe lithography

ASJC Scopus subject areas

  • Engineering(all)

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