Scaling analysis of chemical-vapor-deposited tungsten films by atomic force microscopy

Tatsuo Yoshinobu, Hiroshi Iwasaki

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

We have studied the static surface roughness of 500-nm-thick tungsten chemical-vapor-deposited polycrystalline films on length scales between 5 and 5 x 104 nm, using atomic force microscopy. The interface width scales as a power of the system size for small system sizes (< 1000 nm) but is constant for large sizes, which is in agreement with nonequilibrium interface growth theory. The scaling exponent (0.75 ±0.05) for short-length scales appears to be consistent with the recent prediction based on a conservative volume growth model. In the long-range regime, the rms value becomes larger as the substrate temperature is lowered.

Original languageEnglish
Pages (from-to)1562-1564
Number of pages3
JournalJapanese journal of applied physics
Volume32
Issue number10 B
DOIs
Publication statusPublished - 1993 Oct
Externally publishedYes

Keywords

  • Atomic force microscopy
  • Chemical vapor deposition
  • Experiment
  • Interface roughness
  • Nonequilibrium growth
  • Scaling
  • Self-affine
  • Tungsten

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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