Scaling analysis of a- and poly-Si surface roughness by atomic force microscopy

T. Yoshinobu, A. Iwamoto, K. Sudoh, H. Iwasaki

Research output: Contribution to journalConference articlepeer-review

5 Citations (Scopus)


The scaling behavior of the surface roughness of a- and poly-Si deposited on Si was investigated by atomic force microscopy (AFM). The interface width W(L), defined as the rms roughness as a function of the linear size of the surface area, was calculated from various sizes of AFM images. W(L) increased as a power of L with the roughness exponent α on shorter length scales, and saturated at a constant value of σ on a macroscopic scale. The value of roughness exponent α was 0.48 and 0.90 for a- and poly-Si, respectively, and σ was 1.5 and 13.6nm for 350nm-thick a-Si and 500nm-thick poly-Si, respectively. The AFM images were compared with the surfaces generated by simulation.

Original languageEnglish
Pages (from-to)329-334
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 1995
Externally publishedYes
EventProceedings of the 1994 MRS Fall Meeting - Boston, MA, USA
Duration: 1994 Nov 281994 Dec 1

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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