Scalability of Ni FUSI gate processes: Phase and Vt control to 30 nm gate lengths

J. A. Kittl, A. Veloso, A. Lauwers, K. G. Anil, C. Demeurisse, S. Kubicek, M. Niwa, M. J.H. Van Dal, O. Richard, M. A. Pawlak, M. Jurczak, C. Vrancken, T. Chiarella, S. Brus, K. Maex, S. Biesemans

Research output: Contribution to journalConference articlepeer-review

47 Citations (Scopus)

Abstract

We demonstrate for the first time the scalability of NiSi and Ni 3Si FUSI gate processes down to 30 nm gate lengths, with linewidth independent phase and Vt control. We show that 1-step FUSI is inadequate for NiSi FUSI gates, because it results in incomplete silicidation at low thermal budgets or in a linewidth dependent Ni suicide phase -inducing Vt shifts- at higher thermal budgets. We show that Vt and WF shifts are larger on high-K (HfO2 (250 mV) or HfSiON (330mV)) than on SiON (110mV) and report Fermi level unpinning for Ni-rich FUSI on high-K. In contrast, we demonstrate the scalability of Ni3Si FUSI, with no phase control issues, and report HfSiON Ni3Si FUSI PMOS devices with Vt= -0.33 V. Lastly, we show that, for NiSi, phase control down to narrow gate lengths can be obtained with a 2-step FUSI process.

Original languageEnglish
Article number1469217
Pages (from-to)72-73
Number of pages2
JournalDigest of Technical Papers - Symposium on VLSI Technology
Volume2005
DOIs
Publication statusPublished - 2005 Dec 1
Externally publishedYes
Event2005 Symposium on VLSI Technology - Kyoto, Japan
Duration: 2005 Jun 142005 Jun 14

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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