SAW substrate for duplexer with excellent temperature characteristics and large reflection coefficient realized by using flattened Si02 film and thick heavy metal film

Michio Kadota; Takeshi Nakao; Norio Taniguchi; Eiichi Takata; Masakazu Mimura; Kenji Nishiyama; Takuo Hada; Tomohisa Komura

doi:10.1109/MWSYM.2006.249550

SAW substrate for duplexer with excellent temperature characteristics and large reflection coefficient realized by using flattened Si02 film and thick heavy metal film

Michio Kadota, Takeshi Nakao, Norio Taniguchi, Eiichi Takata, Masakazu Mimura, Kenji Nishiyama, Takuo Hada, Tomohisa Komura

ENG - Robotics

Research output: Contribution to journal › Conference article › peer-review

16 Citations (Scopus)

Abstract

Authors previously proposed a SAW PCS-duplexer with an excellent temperature coefficient of frequency (TCP) and a good frequency characteristic composed of a thick-SiO2/thin-Au-electrodes /LiIaO3 structure. However, a sheet resistance of thin Au electrode is large, compared with thick Al-electrode, so thin Au-electrode is not suitable for filters requiring low loss. Authors tried to use thick Cu electrodes with small resistance By flattening large convex portions on the SiO2 surface, a SAW substrate suitable for US-PCS duplexer with low insertion loss and an excellent TCF was realized.

Original language	English
Article number	4014910
Pages (from-to)	382-385
Number of pages	4
Journal	IEEE MTT-S International Microwave Symposium Digest
DOIs	https://doi.org/10.1109/MWSYM.2006.249550
Publication status	Published - 2006 Dec 1
Event	2006 IEEE MTT-S International Microwave Symposium Digest - San Francisco, CA, United States Duration: 2006 Jun 11 → 2006 Jun 16

Keywords

Cu electrode
Duplexer
Excellent TCF
Flattened SiO2
LiTaO3

ASJC Scopus subject areas

Radiation
Condensed Matter Physics
Electrical and Electronic Engineering

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Kadota, M., Nakao, T., Taniguchi, N., Takata, E., Mimura, M., Nishiyama, K., Hada, T., & Komura, T. (2006). SAW substrate for duplexer with excellent temperature characteristics and large reflection coefficient realized by using flattened Si02 film and thick heavy metal film. IEEE MTT-S International Microwave Symposium Digest, 382-385. [4014910]. https://doi.org/10.1109/MWSYM.2006.249550

SAW substrate for duplexer with excellent temperature characteristics and large reflection coefficient realized by using flattened Si02 film and thick heavy metal film. / Kadota, Michio; Nakao, Takeshi; Taniguchi, Norio; Takata, Eiichi; Mimura, Masakazu; Nishiyama, Kenji; Hada, Takuo; Komura, Tomohisa.

In: IEEE MTT-S International Microwave Symposium Digest, 01.12.2006, p. 382-385.

Research output: Contribution to journal › Conference article › peer-review

Kadota, M, Nakao, T, Taniguchi, N, Takata, E, Mimura, M, Nishiyama, K, Hada, T & Komura, T 2006, 'SAW substrate for duplexer with excellent temperature characteristics and large reflection coefficient realized by using flattened Si02 film and thick heavy metal film', IEEE MTT-S International Microwave Symposium Digest, pp. 382-385. https://doi.org/10.1109/MWSYM.2006.249550

Kadota, Michio ; Nakao, Takeshi ; Taniguchi, Norio ; Takata, Eiichi ; Mimura, Masakazu ; Nishiyama, Kenji ; Hada, Takuo ; Komura, Tomohisa. / SAW substrate for duplexer with excellent temperature characteristics and large reflection coefficient realized by using flattened Si02 film and thick heavy metal film. In: IEEE MTT-S International Microwave Symposium Digest. 2006 ; pp. 382-385.

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abstract = "Authors previously proposed a SAW PCS-duplexer with an excellent temperature coefficient of frequency (TCP) and a good frequency characteristic composed of a thick-SiO2/thin-Au-electrodes /LiIaO3 structure. However, a sheet resistance of thin Au electrode is large, compared with thick Al-electrode, so thin Au-electrode is not suitable for filters requiring low loss. Authors tried to use thick Cu electrodes with small resistance By flattening large convex portions on the SiO2 surface, a SAW substrate suitable for US-PCS duplexer with low insertion loss and an excellent TCF was realized.",

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AU - Mimura, Masakazu

AU - Nishiyama, Kenji

AU - Hada, Takuo

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