Roughness reduction in polycrystalline silicon thin films formed by continuous-wave laser lateral crystallization with Cap SiO2 thin films

Shuntaro Fujii, Shin Ichiro Kuroki, Masayuki Numata, Koji Kotani, Takashi Ito

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

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Engineering & Materials Science

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