Role of ultra thin SiOx layer on epitaxial YSZ/SiOx/Si thin film as multi functional buffer layer by nano-probe and in-situ TEM investigation

Takanori Kiguchi; Naoki Wakiya; Kazuo Shinozaki; Nobuyasu Mizutani

doi:10.1080/713718205

Role of ultra thin SiOx layer on epitaxial YSZ/SiOx/Si thin film as multi functional buffer layer by nano-probe and in-situ TEM investigation

Takanori Kiguchi, Naoki Wakiya, Kazuo Shinozaki, Nobuyasu Mizutani

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Original language	English
Pages (from-to)	89-96
Number of pages	8
Journal	Integrated Ferroelectrics
Volume	45
DOIs	https://doi.org/10.1080/713718205
Publication status	Published - 2002

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Control and Systems Engineering
Ceramics and Composites
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

Access to Document

10.1080/713718205

Cite this

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title = "Role of ultra thin SiOx layer on epitaxial YSZ/SiOx/Si thin film as multi functional buffer layer by nano-probe and in-situ TEM investigation",

author = "Takanori Kiguchi and Naoki Wakiya and Kazuo Shinozaki and Nobuyasu Mizutani",

year = "2002",

doi = "10.1080/713718205",

language = "English",

volume = "45",

pages = "89--96",

journal = "Integrated Ferroelectrics",

issn = "1058-4587",

publisher = "Taylor and Francis Ltd.",

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AU - Wakiya, Naoki

AU - Shinozaki, Kazuo

AU - Mizutani, Nobuyasu

PY - 2002

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DO - 10.1080/713718205

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VL - 45

SP - 89

EP - 96

JO - Integrated Ferroelectrics

JF - Integrated Ferroelectrics

SN - 1058-4587

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