Role of nitrogen incorporation into Hf-based high-& gate dielectrics for termination of local current leakage paths

Heiji Watanabe, Satoshi Kamiyama, Naoto Umezawa, Kenji Shiraishi, Shiniti Yoshida, Yasumasa Watanabe, Tsunetoshi Arikado, Toyohiro Chikyow, Keisaku Yamada, Kiyoshi Yasutake

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20 Citations (Scopus)

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