Reversible 1,2-migration of aryl groups on silyl ligands: Formation and properties of silylenetungsten complexes stabilized by an external base

Eiji Suzuki; Masaaki Okazaki; Hiromi Tobita

doi:10.1246/cl.2005.1026

Reversible 1,2-migration of aryl groups on silyl ligands: Formation and properties of silylenetungsten complexes stabilized by an external base

Eiji Suzuki, Masaaki Okazaki, Hiromi Tobita

SCI - Chemistry

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

Irradiation of Cp*(CO)₃WMe and HSiMe₂Ar (Cp* = η⁵-C₅Me₅, Ar = Ph, ^pTol) in the presence of 4-(dimethylamino)-pyridine (DMAP) led to the formation of base-stabilized silylene complex Cp*(CO)₂W(Ar)(= SiMe₂·DMAP) (1). On gentle heating, 1 was converted to the corresponding silyl complex Cp*(CO)₂(DMAP)WSiMe₂Ar (2) through the 1,2-migration of the aryl ligand to the silylene silicon. Irradiation of 2 reproduced the silylene complex 1.

Original language	English
Pages (from-to)	1026-1027
Number of pages	2
Journal	Chemistry Letters
Volume	34
Issue number	7
DOIs	https://doi.org/10.1246/cl.2005.1026
Publication status	Published - 2005 Jul 5

ASJC Scopus subject areas

Chemistry(all)

Access to Document

10.1246/cl.2005.1026

Fingerprint Dive into the research topics of 'Reversible 1,2-migration of aryl groups on silyl ligands: Formation and properties of silylenetungsten complexes stabilized by an external base'. Together they form a unique fingerprint.

Cite this

@article{d65fd604f6e94e9687847964127de4fb,

title = "Reversible 1,2-migration of aryl groups on silyl ligands: Formation and properties of silylenetungsten complexes stabilized by an external base",

abstract = "Irradiation of Cp*(CO)3WMe and HSiMe2Ar (Cp* = η5-C5Me5, Ar = Ph, pTol) in the presence of 4-(dimethylamino)-pyridine (DMAP) led to the formation of base-stabilized silylene complex Cp*(CO)2W(Ar)(= SiMe2·DMAP) (1). On gentle heating, 1 was converted to the corresponding silyl complex Cp*(CO)2(DMAP)WSiMe2Ar (2) through the 1,2-migration of the aryl ligand to the silylene silicon. Irradiation of 2 reproduced the silylene complex 1.",

author = "Eiji Suzuki and Masaaki Okazaki and Hiromi Tobita",

year = "2005",

month = jul,

day = "5",

doi = "10.1246/cl.2005.1026",

language = "English",

volume = "34",

pages = "1026--1027",

journal = "Chemistry Letters",

issn = "0366-7022",

publisher = "Chemical Society of Japan",

number = "7",

}

TY - JOUR

T1 - Reversible 1,2-migration of aryl groups on silyl ligands

T2 - Formation and properties of silylenetungsten complexes stabilized by an external base

AU - Suzuki, Eiji

AU - Okazaki, Masaaki

AU - Tobita, Hiromi

PY - 2005/7/5

Y1 - 2005/7/5

N2 - Irradiation of Cp*(CO)3WMe and HSiMe2Ar (Cp* = η5-C5Me5, Ar = Ph, pTol) in the presence of 4-(dimethylamino)-pyridine (DMAP) led to the formation of base-stabilized silylene complex Cp*(CO)2W(Ar)(= SiMe2·DMAP) (1). On gentle heating, 1 was converted to the corresponding silyl complex Cp*(CO)2(DMAP)WSiMe2Ar (2) through the 1,2-migration of the aryl ligand to the silylene silicon. Irradiation of 2 reproduced the silylene complex 1.

AB - Irradiation of Cp*(CO)3WMe and HSiMe2Ar (Cp* = η5-C5Me5, Ar = Ph, pTol) in the presence of 4-(dimethylamino)-pyridine (DMAP) led to the formation of base-stabilized silylene complex Cp*(CO)2W(Ar)(= SiMe2·DMAP) (1). On gentle heating, 1 was converted to the corresponding silyl complex Cp*(CO)2(DMAP)WSiMe2Ar (2) through the 1,2-migration of the aryl ligand to the silylene silicon. Irradiation of 2 reproduced the silylene complex 1.

UR - http://www.scopus.com/inward/record.url?scp=26044453866&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=26044453866&partnerID=8YFLogxK

U2 - 10.1246/cl.2005.1026

DO - 10.1246/cl.2005.1026

M3 - Article

AN - SCOPUS:26044453866

VL - 34

SP - 1026

EP - 1027

JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 7

ER -