TY - JOUR
T1 - Reversible 1,2-migration of aryl groups on silyl ligands
T2 - Formation and properties of silylenetungsten complexes stabilized by an external base
AU - Suzuki, Eiji
AU - Okazaki, Masaaki
AU - Tobita, Hiromi
PY - 2005/7/5
Y1 - 2005/7/5
N2 - Irradiation of Cp*(CO)3WMe and HSiMe2Ar (Cp* = η5-C5Me5, Ar = Ph, pTol) in the presence of 4-(dimethylamino)-pyridine (DMAP) led to the formation of base-stabilized silylene complex Cp*(CO)2W(Ar)(= SiMe2·DMAP) (1). On gentle heating, 1 was converted to the corresponding silyl complex Cp*(CO)2(DMAP)WSiMe2Ar (2) through the 1,2-migration of the aryl ligand to the silylene silicon. Irradiation of 2 reproduced the silylene complex 1.
AB - Irradiation of Cp*(CO)3WMe and HSiMe2Ar (Cp* = η5-C5Me5, Ar = Ph, pTol) in the presence of 4-(dimethylamino)-pyridine (DMAP) led to the formation of base-stabilized silylene complex Cp*(CO)2W(Ar)(= SiMe2·DMAP) (1). On gentle heating, 1 was converted to the corresponding silyl complex Cp*(CO)2(DMAP)WSiMe2Ar (2) through the 1,2-migration of the aryl ligand to the silylene silicon. Irradiation of 2 reproduced the silylene complex 1.
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U2 - 10.1246/cl.2005.1026
DO - 10.1246/cl.2005.1026
M3 - Article
AN - SCOPUS:26044453866
VL - 34
SP - 1026
EP - 1027
JO - Chemistry Letters
JF - Chemistry Letters
SN - 0366-7022
IS - 7
ER -