Retention and release of ion implanted deuterium (D) and helium (He) in silicon carbide (SiC) were studied with respect to damage accumulation and annealing behavior using ion beam analysis techniques. α-SiC single crystals were irradiated by 10 keV D2+and He+at 300 and 770 K, and depth profiles of retained atoms and lattice disorder were measured during the implantation and successive heat treatments. For the sample pre-irradiated with He at a fluence of 1.0 × 1021ions/m2, the thermal release of D atoms was completed at an annealing temperature of 1370 K, while the retained D atoms still remained in the sample without pre-irradiation. In contrast to the facilitated thermal release of D by He pre-irradiation, the He release temperature increased in the sample followed by D ion implantation. No significant difference of He retention and damage accumulation behavior was observed between the samples implanted at 300 and 770 K. The D retention and D-ion-induced disorder for 770 K implantation, was reduced to approximately 1/2 comparing to that of the sample implanted at 300 K. The D retention at 770 K was not affected by the He pre-implantation induced damage.
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Materials Science(all)
- Nuclear Energy and Engineering