Resolution limits of nanoimprinted patterns by fluorescence microscopy

Shoichi Kubo, Tatsuya Tomioka, Masaru Nakagawa

    Research output: Contribution to journalArticlepeer-review

    8 Citations (Scopus)

    Abstract

    The authors investigated optical resolution limits to identify minimum distances between convex lines of fluorescent dye-doped nanoimprinted resist patterns by fluorescence microscopy. Fluorescent ultraviolet (UV)-curable resin and thermoplastic resin films were transformed into lineand- space patterns by UV nanoimprinting and thermal nanoimprinting, respectively. Fluorescence immersion observation needed an immersion medium immiscible to the resist films, and an ionic liquid of triisobutyl methylphosphonium tosylate was appropriate for soluble thermoplastic polystyrene patterns. Observation with various numerical aperture (NA) values and two detection wavelength ranges showed that the resolution limits were smaller than the values estimated by the Sparrow criterion. The space width to identify line patterns became narrower as the line width increased. The space width of 100nm was demonstrated to be sufficient to resolve 300-nm-wide lines in the detection wavelength range of 575- 625nm using an objective lens of NA =1:40.

    Original languageEnglish
    Article number06GJ01
    JournalJapanese journal of applied physics
    Volume52
    Issue number6 PART 2
    DOIs
    Publication statusPublished - 2013 Jun 1

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

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