Resistive switching behaviors of ReRAM having W/CeO2/Si/TiN structures

C. Dou, K. Mukai, K. Kakushima, P. Ahmet, K. Tsutsui, A. Nishiyama, N. Sugii, K. Natori, T. Hattori, H. Iwai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

As one of emerging next-generation nonvolatile memories, Resistive RAM (ReRAM) still calls new material technology to improve its performance. By utilizing the special characteristics of cerium oxides, this paper proposes a new method to improve the performance of CeO2 based ReRAM devices by using Si buffer layer. It is confirmed that the device having W/CeO 2/Si/TiN structure shows significant advantage over the device without Si layer for memory application in terms of lower forming voltage, smaller compliance current, larger window and better endurance characteristic. The effect of Si buffer layer is discussed in detail and a model based on filament switching mechanism was also proposed to explain the underlying reasons.

Original languageEnglish
Title of host publicationSilicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11
Pages597-603
Number of pages7
Edition4
DOIs
Publication statusPublished - 2011
Externally publishedYes
EventSilicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11 - 219th ECS Meeting - Montreal, QC, Canada
Duration: 2011 May 12011 May 6

Publication series

NameECS Transactions
Number4
Volume35
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherSilicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11 - 219th ECS Meeting
CountryCanada
CityMontreal, QC
Period11/5/111/5/6

ASJC Scopus subject areas

  • Engineering(all)

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