Resistance of LiCaAlF6 Single Crystals against F2 Laser Irradiation

Yoshizo Kawaguchi, Aiko Narazaki, Hiroyuki Niino, Hiroki Sato, Tsuguo Fukuda, Kiyoshi Shimamura

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The resistance of LiCaAlF6 single crystals against F 2 laser irradiation was studied to examine the possible use of LiCaAlF6 as optical components for F2 laser lithography. After the initial increase by F2 laser cleaning, transmittance of LiCaAlF6 at 157 nm remains relatively unchanged even after irradiation with an F2 laser beam up to 105 pulses at a fluence of approximately 160 mJ·cm-2·pulse -1, indicating good tolerance against the cumulative irradiation. We also discuss the mechanism of the initial increase in transmittance with the results of X-ray photoelectron spectroscopy (XPS). The threshold fluence for the onset of optical damage of LiCaAlF6 is approximately 2 J·cm-2·pulse-1, similar to that of vacuum ultraviolet (VUV) grade CaF2.

Original languageEnglish
Pages (from-to)L1015-L1017
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume42
Issue number8 B
DOIs
Publication statusPublished - 2003 Aug 15

Keywords

  • F laser
  • LiCaAlF
  • Optical damage
  • Optical endurance
  • Threshold fluence
  • Transmittance
  • Vacuum ultraviolet light
  • XPS

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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