Reproducible growth of metalorganic chemical vapor deposition derived YBa2Cu3Ox thin films using ultrasonic gas concentration analyzer

Shuu'ichirou Yamamoto, Kouji Nagata, Satoshi Sugai, Akio Sengoku, Yasunari Matsukawa, Takeo Hattori, Shunri Oda

    Research output: Contribution to journalArticle

    11 Citations (Scopus)

    Abstract

    We report, in detail, on precursor concentration monitoring in the metalorganic chemical vapor deposition (MOCVD) of YBa2Cu3Ox (YBCO) by ultrasonic measurement and a newly developed feedback system to solve reproducibility problems. The fluctuation of the flow rate of dipivaloylmethanate (DPM) compounds has been clearly observed. We have proposed a feedback system using an ultrasonic concentration analyzer and two sets of mass flow controllers for each precursor, and have proven the validity of the operation.

    Original languageEnglish
    Pages (from-to)4727-4732
    Number of pages6
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume38
    Issue number8 B
    Publication statusPublished - 1999 Aug 15

    Keywords

    • Feedback system
    • In situ monitoring
    • Metalorganic chemical vapor deposition
    • Reproducibility
    • Thin films
    • Ultrasonic transducer
    • YBaCuO

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

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