Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection

K. Shigeto; M. Kawamura; A. Yu Kasumov; K. Tsukagoshi; K. Kono; Y. Aoyagi

doi:10.1016/j.mee.2006.01.166

Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection

K. Shigeto, M. Kawamura, A. Yu Kasumov, K. Tsukagoshi, K. Kono, Y. Aoyagi

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

We have reproducibly fabricated suspended tungsten electrodes with a gap of less than 2 nm on a suspended silicon nitride membrane with a slit. Our fabrication technique is based on the local deposition of tungsten by a focused ion beam. The length of the nanogap between the electrodes was controlled by detecting a tunneling current during the growth of the tungsten electrodes from both sides of the slit. The gap length can reach about 1 nm, which corresponds to the size of a single molecule such as a fullerene.

Original language	English
Pages (from-to)	1471-1473
Number of pages	3
Journal	Microelectronic Engineering
Volume	83
Issue number	4-9 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.mee.2006.01.166
Publication status	Published - 2006 Apr
Externally published	Yes

Keywords

Focused ion beam
Nanoelectrode
Single molecule
Tunneling current

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

Access to Document

10.1016/j.mee.2006.01.166

Cite this

@article{a622e647b2b24239a216603cd60d1bf9,

title = "Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection",

abstract = "We have reproducibly fabricated suspended tungsten electrodes with a gap of less than 2 nm on a suspended silicon nitride membrane with a slit. Our fabrication technique is based on the local deposition of tungsten by a focused ion beam. The length of the nanogap between the electrodes was controlled by detecting a tunneling current during the growth of the tungsten electrodes from both sides of the slit. The gap length can reach about 1 nm, which corresponds to the size of a single molecule such as a fullerene.",

keywords = "Focused ion beam, Nanoelectrode, Single molecule, Tunneling current",

author = "K. Shigeto and M. Kawamura and Kasumov, {A. Yu} and K. Tsukagoshi and K. Kono and Y. Aoyagi",

year = "2006",

month = apr,

doi = "10.1016/j.mee.2006.01.166",

language = "English",

volume = "83",

pages = "1471--1473",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "4-9 SPEC. ISS.",

}

TY - JOUR

T1 - Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection

AU - Shigeto, K.

AU - Kawamura, M.

AU - Kasumov, A. Yu

AU - Tsukagoshi, K.

AU - Kono, K.

AU - Aoyagi, Y.

PY - 2006/4

Y1 - 2006/4

N2 - We have reproducibly fabricated suspended tungsten electrodes with a gap of less than 2 nm on a suspended silicon nitride membrane with a slit. Our fabrication technique is based on the local deposition of tungsten by a focused ion beam. The length of the nanogap between the electrodes was controlled by detecting a tunneling current during the growth of the tungsten electrodes from both sides of the slit. The gap length can reach about 1 nm, which corresponds to the size of a single molecule such as a fullerene.

AB - We have reproducibly fabricated suspended tungsten electrodes with a gap of less than 2 nm on a suspended silicon nitride membrane with a slit. Our fabrication technique is based on the local deposition of tungsten by a focused ion beam. The length of the nanogap between the electrodes was controlled by detecting a tunneling current during the growth of the tungsten electrodes from both sides of the slit. The gap length can reach about 1 nm, which corresponds to the size of a single molecule such as a fullerene.

KW - Focused ion beam

KW - Nanoelectrode

KW - Single molecule

KW - Tunneling current

UR - http://www.scopus.com/inward/record.url?scp=33646040126&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33646040126&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2006.01.166

DO - 10.1016/j.mee.2006.01.166

M3 - Article

AN - SCOPUS:33646040126

VL - 83

SP - 1471

EP - 1473

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 4-9 SPEC. ISS.

ER -

Reproducible formation of nanoscale-gap electrodes for single-molecule measurements by combination of FIB deposition and tunneling current detection

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this