Remind again; Quality of thin film fabrication process

Shin Saito, Michitaka Takasaki, Shinichi Ishibashi, Yoshito Ashizawa, Masanobu Onodera, Migaku Takahashi

Research output: Contribution to journalReview articlepeer-review

Abstract

Concept of ultra clean (UC) dry-process proposed by present authors in 1990s has been widely used in various thin film fabrication fields from the view point of research as well as volume production stages of electronic devices. Original basic concept for UC-process sometimes are lead to another wrong concept direction, usually caused by a compromise for temporal trial, space limitation, facility, and so on. In this paper, UC technological items originally proposed is briefly reviewed. Influence of vacuum atmosphere by chamber baking, moisture content in process gas lines, outgasing of co-sputtering cathode equipped with magnetic fluid, and particle sources in fore-pump. are re-checked again in research process for perpendicular magnetic recording media.

Original languageEnglish
Pages (from-to)521-526
Number of pages6
JournalJournal of the Vacuum Society of Japan
Volume53
Issue number9
DOIs
Publication statusPublished - 2010

ASJC Scopus subject areas

  • Materials Science(all)
  • Instrumentation
  • Surfaces and Interfaces
  • Spectroscopy

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