Recovery of plasma-induced mechanical damage in resonators using Neutral Beam Etching: Wafer-scale validation by arrayed cantilevers

Y. Nishimori, S. Ueki, K. Miwa, T. Kubota, S. Samukawa, G. Hashiguchi, M. Sugiyama

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

As an effective application of Neutral Beam Etching (NBE) to MEMS, we here propose a combined approach with conventional plasma process and NBE: removal of plasma-induced damage by NBE. If it is possible, we can obtain a damage-free surface for MEMS devices without a high-temperature annealing process. In order to evaluate the effect of this combined approach quantitatively; we focused on the resonance of a micro cantilever and derived a parameter of surface damage (δE ds) theoretically from Q-factor and resonance frequency. And then we examined the change in δE ds of the cantilevers on an 8-inch wafer before and after NBE treatment. The initial surface of cantilevers had been damaged by plasma processes during their fabrication, and the removal of those damage by NBE was confirmed as the reduction in δE ds.

Original languageEnglish
Title of host publication2012 IEEE 25th International Conference on Micro Electro Mechanical Systems, MEMS 2012
Pages313-316
Number of pages4
DOIs
Publication statusPublished - 2012
Event2012 IEEE 25th International Conference on Micro Electro Mechanical Systems, MEMS 2012 - Paris, France
Duration: 2012 Jan 292012 Feb 2

Publication series

NameProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN (Print)1084-6999

Other

Other2012 IEEE 25th International Conference on Micro Electro Mechanical Systems, MEMS 2012
CountryFrance
CityParis
Period12/1/2912/2/2

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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    Nishimori, Y., Ueki, S., Miwa, K., Kubota, T., Samukawa, S., Hashiguchi, G., & Sugiyama, M. (2012). Recovery of plasma-induced mechanical damage in resonators using Neutral Beam Etching: Wafer-scale validation by arrayed cantilevers. In 2012 IEEE 25th International Conference on Micro Electro Mechanical Systems, MEMS 2012 (pp. 313-316). [6170157] (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)). https://doi.org/10.1109/MEMSYS.2012.6170157