Recent development of demolding technology in nanoimprint lithography

    Research output: Contribution to journalArticlepeer-review


    Current status of advanced ultraviolet nanoimprint lithography (UV-NIL) of Jet-and-Flash Imprint lithography (J-FIL) and UV-NIL using condensable gas is introduced. Demolding technologies of releasing cured resins from mold cavities by using release layers for mold surfaces and surfactant additives to UV-curable resins are summarized. Recent studies by mechanical measurements, surface analyses, and morphological inspections in terms of realizing mass production of nanoimprint lithography devices are described.

    Original languageEnglish
    Pages (from-to)706-709
    Number of pages4
    Issue number9
    Publication statusPublished - 2012 Sept 1


    • Demolding
    • Fluorescence microscopy
    • Nanoimprint lithography
    • Pentafluoropropane
    • Photo-curable resin
    • Release layer
    • Surface segregation

    ASJC Scopus subject areas

    • Chemical Engineering(all)


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