Abstract
Current status of advanced ultraviolet nanoimprint lithography (UV-NIL) of Jet-and-Flash Imprint lithography (J-FIL) and UV-NIL using condensable gas is introduced. Demolding technologies of releasing cured resins from mold cavities by using release layers for mold surfaces and surfactant additives to UV-curable resins are summarized. Recent studies by mechanical measurements, surface analyses, and morphological inspections in terms of realizing mass production of nanoimprint lithography devices are described.
| Original language | English |
|---|---|
| Pages (from-to) | 706-709 |
| Number of pages | 4 |
| Journal | Kobunshi |
| Volume | 61 |
| Issue number | 9 |
| Publication status | Published - 2012 Sept 1 |
Keywords
- Demolding
- Fluorescence microscopy
- Nanoimprint lithography
- Pentafluoropropane
- Photo-curable resin
- Release layer
- Surface segregation
ASJC Scopus subject areas
- Chemical Engineering(all)