Recent development of demolding technology in nanoimprint lithography

Research output: Contribution to journalArticlepeer-review


Current status of advanced ultraviolet nanoimprint lithography (UV-NIL) of Jet-and-Flash Imprint lithography (J-FIL) and UV-NIL using condensable gas is introduced. Demolding technologies of releasing cured resins from mold cavities by using release layers for mold surfaces and surfactant additives to UV-curable resins are summarized. Recent studies by mechanical measurements, surface analyses, and morphological inspections in terms of realizing mass production of nanoimprint lithography devices are described.

Original languageEnglish
Pages (from-to)706-709
Number of pages4
Issue number9
Publication statusPublished - 2012 Sep 1


  • Demolding
  • Fluorescence microscopy
  • Nanoimprint lithography
  • Pentafluoropropane
  • Photo-curable resin
  • Release layer
  • Surface segregation

ASJC Scopus subject areas

  • Chemical Engineering(all)

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