Recent advance in single-ion implantation method for single-dopant devices

Takahiro Shinada, Masahiro Hori, Keigo Taira, Tetsuo Endoh, Iwao Ohdomari

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)
Original languageEnglish
Title of host publicationExtended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009
Pages96-99
Number of pages4
DOIs
Publication statusPublished - 2009 Dec 1
Event9th International Workshop on Junction Technology, IWJT 2009 - Kyoto, Japan
Duration: 2009 Jun 112009 Jun 12

Publication series

NameExtended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009

Other

Other9th International Workshop on Junction Technology, IWJT 2009
CountryJapan
CityKyoto
Period09/6/1109/6/12

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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