Recent advance in single-ion implantation method for single-dopant devices

Takahiro Shinada, Masahiro Hori, Keigo Taira, Tetsuo Endoh, Iwao Ohdomari

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)
Original languageEnglish
Title of host publicationExtended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009
Pages96-99
Number of pages4
DOIs
Publication statusPublished - 2009 Dec 1
Event9th International Workshop on Junction Technology, IWJT 2009 - Kyoto, Japan
Duration: 2009 Jun 112009 Jun 12

Publication series

NameExtended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009

Other

Other9th International Workshop on Junction Technology, IWJT 2009
Country/TerritoryJapan
CityKyoto
Period09/6/1109/6/12

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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