Real-time monitoring of successive sparks in high-density plasma chambers

Michio Sato, Hiroto Ohtake, Koichi Suzuki, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


Successive sparks in high-density plasma were analyzed using various real-time monitoring systems, such as electromagnetic field sensors and on-wafer sensors. Electron density decreases at the moment the sparking occurs because a large number of electrons flow to the chamber wall and the wafer surface. Due to the potential fluctuation of the plasma, other sparks occur successively during recovery to the stable plasma. The successive sparks sometimes continue for a few milliseconds. Based on these findings, the authors found that electromagnetic field sensors and on-wafer sensors are very effective tools for real-time monitoring of successive sparks.

Original languageEnglish
Pages (from-to)1594-1598
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number6
Publication statusPublished - 2007 Nov 19

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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