Radio frequency ion source operated with field effect transistor based radio frequency system

A. Ando, A. Komuro, T. Matsuno, K. Tsumori, Y. Takeiri

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 1018 m-3 is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5× 1018 m-3 with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz.

Original languageEnglish
Article number02B107
JournalReview of Scientific Instruments
Volume81
Issue number2
DOIs
Publication statusPublished - 2010

ASJC Scopus subject areas

  • Instrumentation

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