Radiation-Induced Reactions of Chloromethylstyrene-Based Resist Materials Analyzed from Radiolysis of Low Molecular Model Compounds

Katsumi Tanigaki, Masayoshi Suzuki, Yasushi Saotome, Yoshitake Ohnishi

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

The radiation-induced reactions of chloromethylstyrene-based resist materials are studied by low temperature ESR and gas chromatography-mass spectrometry (GC-MS) analyses using low molecular model compounds. Low temperature ESR analyses indicate that main radiation-induced active species in the initial stage of the reaction are benzyl radicals formed through chlorine removal from chloromethylstyrene units and simultaneously produced active chlorines. The amount of the a radicals formed through α-hydrogen cleavage is less than one-tenth that of the benzyl radicals. GC-MS analyses indicate that large amounts of a radicals are produced through the subsequently occurring hydrogen abstractions by radiation-induced active chlorines. The susceptibilities of individual constituents to hydrogen abstractions are determind as 6.2 for a methylstyrene unit, 2.6 for a styrene unit, and 1 for a chloromethylstyrene unit.

Original languageEnglish
Pages (from-to)1678-1683
Number of pages6
JournalJournal of the Electrochemical Society
Volume132
Issue number7
DOIs
Publication statusPublished - 1985 Jul

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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