Radiation damage processes in complex-oxide scintillators

Martin Nikl, Eva Mihokova, Valentin Laguta, Jan Pejchal, Stefania Baccaro, Anna Vedda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

14 Citations (Scopus)

Abstract

Gamma radiation induced absorption processes of various scintillating materials were studied at room temperature. Single crystal of PbWO4, Ce-doped YAlO3 and Ce(Pr)-doped Y(Lu)3Al5O 12 were irradiated by 60Co and doses ranging between 1-500 Gy. Broad induced absorption spectra obtained were decomposed into separate Gaussian components and tentatively ascribed to specific color centres. Supporting thermoluminescence and electron paramagnetic resonance experiments were performed to reveal the nature of charge carrier traps. The influence of codoping by aliovalent ions is also shown and discussed.

Original languageEnglish
Title of host publicationDamage to VUV, EUV, and X-ray Optics
DOIs
Publication statusPublished - 2007 Nov 19
EventDamage to VUV, EUV, and X-ray Optics - Prague, Czech Republic
Duration: 2007 Apr 182007 Apr 19

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6586
ISSN (Print)0277-786X

Conference

ConferenceDamage to VUV, EUV, and X-ray Optics
CountryCzech Republic
CityPrague
Period07/4/1807/4/19

Keywords

  • Color centers
  • PbWO
  • Radiation damage
  • Scintillator
  • YAG
  • YAP

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Radiation damage processes in complex-oxide scintillators'. Together they form a unique fingerprint.

  • Cite this

    Nikl, M., Mihokova, E., Laguta, V., Pejchal, J., Baccaro, S., & Vedda, A. (2007). Radiation damage processes in complex-oxide scintillators. In Damage to VUV, EUV, and X-ray Optics [65860E] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6586). https://doi.org/10.1117/12.724737