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Quarter-micron selective-epitaxial-silicon refilled trench (SRT) isolation technology with substrate shield
M. Aoki, H. Takato, S. Samata, M. Numano, A. Yagishita, K. Hieda, Akihiro Nitayama, F. Horiguchi
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
1
Citation
(Scopus)