Quantum diffraction and interference of biphotons generated by parametric down conversion

R. Shimizu, K. Edamatsu, T. Itoh

Research output: Contribution to conferencePaper

Abstract

Quantum lithography using a multiphoton state attracts much attention as a novel method to improve optical spatial resolution beyond the classical limit. As such, a proof-of-principle experiment of quantum lithography utilizing parametric down-converted photons and a transmission grating was demonstrated. It was shown that the diffraction of a multiphoton state can be also explained by the concept of the photonic de Broglie wave.

Original languageEnglish
Pages30-31
Number of pages2
Publication statusPublished - 2002 Jan 1
Externally publishedYes
EventQuantum Electronics and Laser Science (QELS) 2002 - Long Beach, CA, United States
Duration: 2002 May 192002 May 24

Other

OtherQuantum Electronics and Laser Science (QELS) 2002
CountryUnited States
CityLong Beach, CA
Period02/5/1902/5/24

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • Cite this

    Shimizu, R., Edamatsu, K., & Itoh, T. (2002). Quantum diffraction and interference of biphotons generated by parametric down conversion. 30-31. Paper presented at Quantum Electronics and Laser Science (QELS) 2002, Long Beach, CA, United States.