Quantitative analysis of thin-film conductivity by scanning microwave microscope

Sohei Okazaki, Noriaki Okazaki, Yasushi Hirose, Yutaka Furubayashi, Taro Hitosugi, Toshihiro Shimada, Tetsuya Hasegawa

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)

    Abstract

    We propose a novel method for high-throughput quantitative analysis of thin-film conductivity σ by using a scanning microwave microscope (SμM). We demonstrated that composition spread thin films of Ti 1-x Nb x O 2 can be utilized as a standard reference in a wide σ range. The shift in Q-value measured by SμM along the composition-spread axis showed a single peak, which moved to the lower x side with film thickness. This behavior was confirmed by electrical field simulation using the finite element method.

    Original languageEnglish
    Pages (from-to)757-759
    Number of pages3
    JournalApplied Surface Science
    Volume254
    Issue number3
    DOIs
    Publication statusPublished - 2007 Nov 30

    Keywords

    • Combinatorial materials science
    • Conductivity
    • Finite element method
    • Quantitative analysis
    • Scanning microwave microscope
    • Thin-film

    ASJC Scopus subject areas

    • Chemistry(all)
    • Condensed Matter Physics
    • Physics and Astronomy(all)
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films

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